Metal films & electrodes
Deposit conductive layers such as Au, Ag, Cu, Al or Ti.
Useful forElectrodes, contacts, conductive coatingsSample Processing & Coating
RF/DC Magnetron Sputtering & Thermal Evaporation Coating
Thin-film deposition by sputtering and thermal evaporation
Magnetron sputtering and thermal evaporation deposit thin metal, alloy and oxide films on your substrates under vacuum. They are used to make electrodes, contacts and test coatings of controlled thickness.
4 test optionsDC, RF and co-sputteringFilms from ~5 nm to 1 µmTypical turnaround 5–8 working days
RF/DC Sputtering & Thermal Evaporation Coating processIllustrative
01 / Overview
What is RF/DC Magnetron Sputtering & Thermal Evaporation Coating?
In magnetron sputtering, argon ions from a magnetically confined plasma knock atoms off a target, and these condense on the substrate as a film; DC power suits conductive targets, while RF power also sputters insulators. In thermal evaporation, a metal is heated in a boat until it vaporises and coats the substrate.
Sputtering gives dense, well-adhered films of metals, alloys and oxides, and co-sputtering two targets tunes the composition. Evaporation is gentler and quicker for metals such as Al, Ag or Au, and works well through shadow masks for contacts.
02 / How it works
How it works
- 01
Substrates are loaded
Clean substrates are mounted on the holder and the chamber is pumped down to high vacuum.
- 02
Plasma is struck
Argon is let in and RF or DC power ignites a plasma over the magnetron target.
- 03
Film is deposited
Sputtered atoms, or vapour from a heated boat, travel to the substrate and condense as a film.
- 04
Thickness is controlled
A crystal thickness monitor and a shutter stop deposition at the agreed thickness.
03 / What it measures
What it measures
Oxide & insulating films
RF sputtering deposits oxides, nitrides and other insulators.
Useful forDielectric, optical and transparent conducting layersAlloy & mixed films
Co-sputter two targets at once to tune the film composition.
Useful forDoped films, alloy and composition studiesEvaporated contacts
Thermally evaporate metals such as Al, Ag or Au, often through a shadow mask.
Useful forDevice contacts and patterned electrodesControlled thickness
Films from a few nanometres to around a micron, monitored during growth.
Useful forThin-film studies and multilayers04 / Test options
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05 / Sample requirements
Sample requirements
- Accepted substrates
- Glass, silicon, quartz, FTO/ITO glass, metal foils, vacuum-safe polymer films
- Size
- Typically up to 50 × 50 mm, flat, under ~5 mm thick
- Coating material
- Common metals and oxides from lab stock; other targets by discussion
- Details needed
- Material, thickness, number of substrates and any mask pattern
- Clean, dry, dust-free substrates, ideally degreased
- State the material, thickness and which side to coat
- Provide shadow masks if a pattern is needed
- No wet, oily or outgassing samples
- No powders or loose particles
Hazardous or air-sensitive samples: mention it in your request, and attach the MSDS if you have one.
06 / Results & turnaround
Results & turnaround
What you receive
- Coated substrates returned in sealed carriers
- Deposition log: power, pressure, time and rate
- Nominal thickness from the crystal monitor
- Photographs of coated samples
- Report PDF
Turnaround & pricing
Typically 5–8 working days after samples reach the lab.
Price confirmed in your quotation, depending on user type, options and number of samples.
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